Wolfspeed, Inc.
SEMICONDUCTOR POWER DEVICES HAVING GRADED LATERAL DOPING IN THE SOURCE REGION
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Abstract:
A semiconductor device includes a semiconductor layer structure comprising a source/drain region, a gate dielectric layer on the semiconductor layer structure, and a gate electrode on the gate dielectric layer. The source/drain region comprises a first portion comprising a first dopant concentration and a second portion comprising a second dopant concentration. The second portion is closer to a center of the gate electrode than the first portion.
Status:
Application
Type:
Utility
Filling date:
4 Jun 2020
Issue date:
9 Dec 2021