Wolfspeed, Inc.
SEMICONDUCTOR POWER DEVICES HAVING GRADED LATERAL DOPING IN THE SOURCE REGION

Last updated:

Abstract:

A semiconductor device includes a semiconductor layer structure comprising a source/drain region, a gate dielectric layer on the semiconductor layer structure, and a gate electrode on the gate dielectric layer. The source/drain region comprises a first portion comprising a first dopant concentration and a second portion comprising a second dopant concentration. The second portion is closer to a center of the gate electrode than the first portion.

Status:
Application
Type:

Utility

Filling date:

4 Jun 2020

Issue date:

9 Dec 2021