Maxim Integrated Products, Inc.
TRANSISTORS WITH DUAL GATE CONDUCTORS, AND ASSOCIATED METHODS

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Abstract:

A lateral double-diffused metal-oxide-semiconductor (LDMOS) transistor includes a silicon semiconductor structure and a vertical gate. The vertical gate includes (a) a first gate conductor and a second gate conductor each extending from a first outer surface of the silicon semiconductor structure into the silicon semiconductor structure in a thickness direction, (b) a first separation dielectric layer separating the first gate conductor from the second gate conductor within the vertical gate, and (c) a gate dielectric layer separating each of the first gate conductor and the second gate conductor from the silicon semiconductor structure.

Status:
Application
Type:

Utility

Filling date:

5 Jun 2018

Issue date:

5 Dec 2019