Microchip Technology Incorporated
ELECTRONIC FUSE (E-FUSE) WITH DISPLACEMENT-PLATED E-FUSE TERMINALS

Abstract:

An electronic fuse (e-fuse) module may be formed in copper interconnect in an integrated circuit device. A pair of e-fuse terminals may be formed by forming a pair of spaced-apart e-fuse terminal structures (e.g., copper damascene structures) and forming a conductive barrier region on each e-fuse terminal structure. The barrier regions may be formed by displacement plating a conductive barrier layer, e.g., comprising CoWP, CoWB, Pd, CoP, Ni, Co, or Ni--Co alloy, on each e-fuse terminal structure. An e-fuse element, e.g., comprising NiCr, TiW, TiWN, or Al, may be formed on the barrier regions of the pair of e-fuse terminals to define a conductive path between the pair of e-fuse terminal structures through the e-fuse element and through the barrier region on each e-fuse terminal structure. The barrier regions may protect the e-fuse terminal structures (e.g., copper structures) from corrosion and/or diffusion.