Texas Instruments Incorporated
FIN FIELD EFFECT TRANSISTOR WITH MERGED DRIFT REGION

Abstract:

A fin field effect transistor (FinFET) includes a drain region, a merged drift region, and a plurality of fins. The drain region extends above a surface of a semiconductor substrate and has a first dopant concentration of first conductivity type. The merged drift region extends above the substrate surface and touches the drain region, and has a second lower dopant concentration of the first conductivity type. The plurality of fins extend above the substrate surface and each fin is directly connected to the merged drift region. Each fin is connected to a source region having the first conductivity type at a distal end of that fin from the merged drift region.