Texas Instruments Incorporated
GALLIUM NITRIDE TRANSISTOR WITH A DOPED REGION
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Abstract:
In some examples, a transistor comprises a gallium nitride (GaN) layer; a GaN-based alloy layer having a top side and disposed on the GaN layer, wherein source, drain, and gate contact structures are supported by the GaN layer; and a first doped region positioned in a drain access region and extending from the top side into the GaN layer.
Status:
Application
Type:
Utility
Filling date:
2 Feb 2021
Issue date:
27 May 2021