Texas Instruments Incorporated
THERMAL ROUTING TRENCH BY ADDITIVE PROCESSING

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Abstract:

An integrated circuit has a substrate that includes a semiconductor material, and an interconnect region disposed on the substrate. The integrated circuit includes a thermal routing trench in the substrate. The thermal routing trench includes a cohered nanoparticle film in which adjacent nanoparticles are cohered to each other. The thermal routing trench has a thermal conductivity higher than the semiconductor material contacting the thermal routing trench. The cohered nanoparticle film is formed by an additive process.

Status:
Application
Type:

Utility

Filling date:

7 Dec 2020

Issue date:

22 Apr 2021