Texas Instruments Incorporated
Transistor device with sinker contacts and methods for manufacturing the same
Last updated:
Abstract:
In described examples, a device includes a semiconductor substrate; a buried layer; and a trench with inner walls extending from the buried layer to a surface of the semiconductor substrate, the trench having sidewalls, a bottom wall, a barrier layer including a titanium (Ti) layer covering the sidewalls and the bottom wall, and a filler including more than one layer of conductor material formed on the barrier layer.
Status:
Grant
Type:
Utility
Filling date:
14 Jul 2017
Issue date:
15 Jun 2021