Texas Instruments Incorporated
LDMOS transistor with gate structure having alternating regions of wider and narrower spacing to a body region
Last updated:
Abstract:
A power transistor is provided with at least one transistor finger that lies within a semiconductor material. The gate oxide is segmented into a set of segments with thick field oxide between each segment in order to reduce gate capacitance and thereby improve a resistance times gate charge figure of merit.
Status:
Grant
Type:
Utility
Filling date:
1 Feb 2019
Issue date:
11 May 2021