Texas Instruments Incorporated
LDMOS transistor with gate structure having alternating regions of wider and narrower spacing to a body region

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Abstract:

A power transistor is provided with at least one transistor finger that lies within a semiconductor material. The gate oxide is segmented into a set of segments with thick field oxide between each segment in order to reduce gate capacitance and thereby improve a resistance times gate charge figure of merit.

Status:
Grant
Type:

Utility

Filling date:

1 Feb 2019

Issue date:

11 May 2021