Texas Instruments Incorporated
Gallium nitride transistor with a doped region

Last updated:

Abstract:

In some examples, a transistor comprises a gallium nitride (GaN) layer; a GaN-based alloy layer having a top side and disposed on the GaN layer, wherein source, drain, and gate contact structures are supported by the GaN layer; and a first doped region positioned in a drain access region and extending from the top side into the GaN layer.

Status:
Grant
Type:

Utility

Filling date:

19 Nov 2018

Issue date:

30 Mar 2021