Applied Materials, Inc.
REMOTE PLASMA CLEANING OF CHAMBERS FOR ELECTRONICS MANUFACTURING SYSTEMS

Last updated:

Abstract:

A method of cleaning a chamber for an electronics manufacturing system includes flowing a gas mixture comprising oxygen and a carrier gas into a remote plasma generator. The method further includes generating a plasma from the gas mixture by the remote plasma generator and performing a remote plasma cleaning of the chamber by flowing the plasma into an interior of the chamber, wherein the plasma removes a plurality of organic contaminants from the chamber.

Status:
Application
Type:

Utility

Filling date:

26 Mar 2021

Issue date:

30 Sep 2021