Applied Materials, Inc.
REMOTE PLASMA CLEANING OF CHAMBERS FOR ELECTRONICS MANUFACTURING SYSTEMS
Last updated:
Abstract:
A method of cleaning a chamber for an electronics manufacturing system includes flowing a gas mixture comprising oxygen and a carrier gas into a remote plasma generator. The method further includes generating a plasma from the gas mixture by the remote plasma generator and performing a remote plasma cleaning of the chamber by flowing the plasma into an interior of the chamber, wherein the plasma removes a plurality of organic contaminants from the chamber.
Status:
Application
Type:
Utility
Filling date:
26 Mar 2021
Issue date:
30 Sep 2021