Applied Materials, Inc.
NITROGEN-DOPED CARBON HARDMASK FILMS
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Abstract:
Disclosed herein is a method and apparatus for forming carbon hard masks to improve deposition uniformity and etch selectivity. The carbon hard mask may be formed in a PECVD process chamber and is a nitrogen-doped carbon hardmask. The nitrogen-doped carbon hardmask is formed using a nitrogen containing gas, an argon containing gas, and a hydrocarbon gas.
Status:
Application
Type:
Utility
Filling date:
20 Apr 2020
Issue date:
21 Oct 2021