Applied Materials, Inc.
Extreme Ultraviolet Mask Blank Defect Reduction

Last updated:

Abstract:

Extreme ultraviolet (EUV) mask blanks and methods for their manufacture, and production systems therefor are disclosed. The method for forming an EUV mask blank comprises smoothing out surface defects on a surface of a substrate.

Status:
Application
Type:

Utility

Filling date:

20 Apr 2021

Issue date:

28 Oct 2021