Applied Materials, Inc.
Extreme Ultraviolet Mask Blank Defect Reduction
Last updated:
Abstract:
Extreme ultraviolet (EUV) mask blanks and methods for their manufacture, and production systems therefor are disclosed. The method for forming an EUV mask blank comprises smoothing out surface defects on a surface of a substrate.
Status:
Application
Type:
Utility
Filling date:
20 Apr 2021
Issue date:
28 Oct 2021