Applied Materials, Inc.
APPARATUS FOR PROCESSING A SUBSTRATE, SYSTEM FOR PROCESSING A SUBSTRATE, AND METHODS THEREFOR

Abstract:

An apparatus for processing a substrate in a vacuum chamber is described. The apparatus includes a first carrier transport system for transporting a first carrier along a first transport path in a first direction and a second carrier transport system for transporting a second carrier along a second transport path in the first direction. Further, the apparatus includes a measurement system for measuring a distance between the first carrier and the second carrier. The distance is perpendicular to the first direction.