Applied Materials, Inc.
Atomic layer deposition of protective coatings for semiconductor process chamber components

Abstract:

A multi-component coating composition for a surface of a chamber component comprising at least one first film layer of a yttrium oxide coated onto the surface of the chamber component using an atomic layer deposition process and at least one second film layer of zirconium oxide coated onto the surface of the chamber component using an atomic layer deposition process, wherein the multi-component coating comprises YZr.sub.xO.sub.y.