Applied Materials, Inc.
In-situ full wafer metrology system

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Abstract:

Full wafer in-situ metrology chambers and methods of use are described. The metrology chambers include a substrate support and a sensor bar that are rotatable relative to each other. The sensor bar includes a plurality of sensors at different radii from a central axis.

Status:
Grant
Type:

Utility

Filling date:

13 Mar 2020

Issue date:

21 Dec 2021