Applied Materials, Inc.
METHOD FOR CLEANING A VACUUM SYSTEM, METHOD FOR VACUUM PROCESSING OF A SUBSTRATE, AND APPARATUS FOR VACUUM PROCESSING A SUBSTRATE

Abstract:

A method for cleaning a vacuum chamber, particularly a vacuum chamber used in the manufacture of OLED devices is described. The method includes cleaning at least one of an inside of the vacuum chamber and a component inside the vacuum chamber with active species, a process gas for generating the active species includes at least 90% oxygen and 5 at least 2% argon, particularly, wherein the process gas includes about 95% oxygen and about 5% argon.