Applied Materials, Inc.
Physical vapor deposition system and processes
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Abstract:
A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets. A process for improving reflectivity from a multilayer stack is also disclosed.
Status:
Grant
Type:
Utility
Filling date:
26 Feb 2020
Issue date:
1 Feb 2022