Applied Materials, Inc.
Physical vapor deposition system and processes

Last updated:

Abstract:

A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets. A process for improving reflectivity from a multilayer stack is also disclosed.

Status:
Grant
Type:

Utility

Filling date:

26 Feb 2020

Issue date:

1 Feb 2022