Applied Materials, Inc.
Multi-layer plasma resistant coating by atomic layer deposition

Abstract:

Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of a chamber component using an atomic layer deposition (ALD) process. The plasma resistant coating has a stress relief layer and a layer comprising a solid solution of Y.sub.2O.sub.3--ZrO.sub.2 and uniformly covers features, such as those having an aspect ratio of about 3:1 to about 300:1.