Applied Materials, Inc.
LARGE AREA SEAMLESS MASTER AND IMPRINT STAMP MANUFACTURING METHOD
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Abstract:
Embodiments of the present disclosure generally relate to pattern replication, imprint lithography, and more particularly to methods and apparatuses for creating a large area imprint without a seam. Methods disclosed herein generally include filling seams between pairs of masters with a filler material such that the seams are flush with a surface of the masters having a plurality of features disposed thereon.
Status:
Application
Type:
Utility
Filling date:
9 Feb 2020
Issue date:
21 Apr 2022