Applied Materials, Inc.
MULTI-LAYER PLASMA RESISTANT COATING BY ATOMIC LAYER DEPOSITION

Abstract:

Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of an article using an atomic layer deposition (ALD) process. The plasma resistant coating has a first layer and a second layer including a solid solution of Y.sub.2O.sub.3-ZrO.sub.2 and uniformly covers features, such as those having an aspect ratio of length to width of about 3:1 to about 300:1.