Applied Materials, Inc.
PLANARIZED CRYSTALLINE FILMS FOR DIFFRACTIVE OPTICS

Abstract:

Optical device films and methods of forming optical device films having a RMS surface roughness less than about 2.2 .mu.in and a refractive index greater than 2.0 are provided. In one embodiment, an optical device film is provided and includes a crystalline or nano-crystalline material having a refractive index greater than 2.0. A top surface of the optical device film has a root-mean-square (RMS) surface roughness less than about 2.2 microinches (.mu.in).