Applied Materials, Inc.
Conformal High Concentration Boron Doping Of Semiconductors
Last updated:
Abstract:
Methods of doping a semiconductor material are disclosed. Some embodiments provide for conformal doping of three dimensional structures. Some embodiments provide for doping with high concentrations of boron for p-type doping.
Status:
Application
Type:
Utility
Filling date:
20 Apr 2022
Issue date:
4 Aug 2022