Applied Materials, Inc.
Method of imprinting tilt angle light gratings

Abstract:

Embodiments described herein relate to methods of fabricating waveguide structures with gratings having front angles less than about 45.degree. and back angles less than about 45.degree.. The methods include imprinting stamps into nanoimprint resists disposed on substrates. The nanoimprint resists are subjected to a cure process. The stamps are released from the nanoimprint resist at a release angle using a release method. The nanoimprint resists are subjected to an anneal process to form a waveguide structure comprising a plurality of gratings with a front angle .alpha. and a back angle .beta. relative to a second plane of the surface of the substrate less than about 45.degree..