Applied Materials, Inc.
Measurement system and grating pattern array

Abstract:

Embodiments of the present disclosure include measurement systems and grating pattern arrays. The measurement systems include multiple subsystems for creating diffraction patterns or magnified real images of grating regions on a substrate. The measurements systems are configured to reflect and transmit light, and the reflected and transmitted beams create diffraction patterns and enlarged images. The diffraction patterns and images provide information on grating pitch and angles of grating regions. Grating pattern arrays disposed on a substrate include main regions and reference regions. The reference regions are used to locate corresponding main regions. The measurement systems do not include a rotating stage, and thus precise control of rotation of a stage is not needed.