Applied Materials, Inc.
Ruthenium precursors for ALD and CVD thin film deposition and uses thereof

Abstract:

Metal coordination complexes comprising a metal atom coordinated to at least one diazabutadiene ligand having a structure represented by: ##STR00001## where each R is independently a C1-C13 alkyl or aryl group and each R' is independently H, C1-C10 alkyl or aryl group are described. Processing methods using the metal coordination complexes are also described.