Applied Materials, Inc.
Physical vapor deposition in-chamber electro-magnet

Last updated:

Abstract:

A PVD chamber deposits a film with high thickness uniformity. The PVD chamber includes a coil of an electromagnetic that, when energized with direct current power, can modify plasma in an edge portion of the processing region of the PVD chamber. The coil is disposed within the vacuum-containing portion of the PVD chamber and outside a processing region of the PVD chamber.

Status:
Grant
Type:

Utility

Filling date:

9 May 2018

Issue date:

15 Dec 2020