Applied Materials, Inc.
Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten
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Abstract:
Provided are atomic layer deposition methods to deposit a tungsten film or tungsten-containing film using a tungsten-containing reactive gas comprising one or more of tungsten pentachloride, a compound with the empirical formula WCl.sub.5 or WCl.sub.6.
Status:
Grant
Type:
Utility
Filling date:
6 Apr 2021
Issue date:
22 Jul 2021