Applied Materials, Inc.
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

Abstract:

Methods and apparatus for processing a substrate are provided herein. For example, an apparatus can be a controller for a high peak power radio frequency (RF) generator. The controller comprises a control logic circuit in operable communication with an RF generator operating in a burst mode, the control logic circuit configured to receive a power, P, request at a predetermined duty cycle, .delta., from a plasma processing chamber, determine a peak maximum power, P.sub.peak.sup.max, based on a maximum average power, P.sub.avg.sup.max, and a maximum absolute power, P.sub.abs.sup.max, of the RF generator and the predetermined duty cycle, and transmit a control signal to the RF generator to limit a peak power, P.sub.peak, to the plasma processing chamber based on the P.sub.peak.sup.max.