Applied Materials, Inc.
Multilayer Reflector And Methods Of Manufacture And Patterning

Abstract:

Extreme ultraviolet (EUV) hard masks and methods for their manufacture are disclosed. The EUV hardmasks comprise a substrate, a multilayer stack of alternating reflective layers on the substrate, and a photoresist layer on the multilayer stack. The alternating reflective layers comprise silicon and a nonmetal. Methods of transferring a pattern to a substrate are also disclosed.