Applied Materials, Inc.
Compositions and Methods of Additive Manufacturing of Polishing Pads

Last updated:

Abstract:

A system, formulation, and method for additive manufacturing of a polishing layer of a polishing pad. The formulation includes a urethane acrylate oligomer based on a difunctional polyol or difunctional polythiol. The techniques includes selecting the difunctional polyol or the difunctional polythiol to affect a property of the polishing layer. The formulation also includes a monomer and a photoinitiator. The viscosity of the formulation is applicable for 3D printing of the polishing layer.

Status:
Grant
Type:

Utility

Filling date:

12 Nov 2019

Issue date:

11 Mar 2021