Applied Materials, Inc.
EXTREME ULTRAVIOLET MASK BLANK DEFECT REDUCTION METHODS

Abstract:

Extreme ultraviolet (EUV) mask blanks, methods for their manufacture, and production systems therefor are disclosed. A method for forming an EUV mask blank comprises placing a substrate in a multi-cathode physical vapor deposition chamber, depositing a multilayer stack, removing the substrate from the chamber and passivating the PVD chamber.