Applied Materials, Inc.
REAL-TIME ANOMALY DETECTION AND CLASSIFICATION DURING SEMICONDUCTOR PROCESSING

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Abstract:

A method of detecting and classifying anomalies during semiconductor processing includes executing a wafer recipe a semiconductor processing system to process a semiconductor wafer; monitoring sensor outputs from a sensors that monitor conditions associated with the semiconductor processing system; providing the sensor outputs to models trained to identify when the conditions associated with the semiconductor processing system indicate a fault in the semiconductor wafer; receiving an indication of a fault from at least one of the models; and generating a fault output in response to receiving the indication of the fault.

Status:
Grant
Type:

Utility

Filling date:

21 Oct 2019

Issue date:

22 Apr 2021