Applied Materials, Inc.
Methods For Gapfill In High Aspect Ratio Structures

Last updated:

Abstract:

Methods for seam-less gapfill comprising sequentially depositing a film with a seam, reducing the height of the film to remove the seam and repeating until a seam-less film is formed. Some embodiments include optional film doping and film treatment (e.g., ion implantation and annealing).

Status:
Grant
Type:

Utility

Filling date:

13 Oct 2020

Issue date:

28 Jan 2021