Applied Materials, Inc.
Methods For Gapfill In High Aspect Ratio Structures
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Abstract:
Methods for seam-less gapfill comprising sequentially depositing a film with a seam, reducing the height of the film to remove the seam and repeating until a seam-less film is formed. Some embodiments include optional film doping and film treatment (e.g., ion implantation and annealing).
Status:
Grant
Type:
Utility
Filling date:
13 Oct 2020
Issue date:
28 Jan 2021