Applied Materials, Inc.
APERTURE DESIGN FOR UNIFORMITY CONTROL IN SELECTIVE PHYSICAL VAPOR DEPOSITION

Abstract:

Methods and apparatus for a PVD chamber are provided herein. In some embodiments, a selective PVD chamber includes a first housing surrounding a movable substrate support; a second housing adjacent the first housing; an opening disposed between the first housing and the second housing that partially exposes a top surface of the movable substrate support, wherein the opening includes a first curved side; and an elongate target disposed in the second housing to provide a stream of material flux from the elongate target into the first housing via the opening.