Applied Materials, Inc.
TOP BUFFER LAYER FOR MAGNETIC TUNNEL JUNCTION APPLICATION

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Abstract:

Embodiments of the disclosure provide methods and apparatus for fabricating magnetic tunnel junction (MTJ) structures on a substrate for MRAM applications. In one embodiment, a magnetic tunnel junction (MTJ) device structure includes a junction structure disposed on a substrate, the junction structure comprising a first ferromagnetic layer and a second ferromagnetic layer sandwiching a tunneling barrier layer, a dielectric capping layer disposed on the junction structure, a metal capping layer disposed on the junction structure, and a top buffer layer disposed on the metal capping layer.

Status:
Grant
Type:

Utility

Filling date:

21 Jun 2019

Issue date:

24 Dec 2020