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Ferroelectric based transistors

Abstract:

The present disclosure relates to semiconductor structures and, more particularly, to ferroelectric based transistors and methods of manufacture. The ferroelectric based transistor includes: a semiconductor-on-insulator substrate including a semiconductor material, a buried insulator layer under the semiconductor material and a substrate material under the semiconductor channel material; a ferroelectric capacitor under the buried insulator layer and which includes a bottom electrode, a top electrode and a ferroelectric material between the bottom electrode and the top electrode; a gate stack over the semiconductor material; a first terminal contact connecting to the bottom electrode of the ferroelectric capacitor; and a second terminal contact connecting to the top electrode of the ferroelectric capacitor.