ASML Holding N.V.
Lithographic process and apparatus and inspection process and apparatus

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Abstract:

A lithographic apparatus and associated method of controlling a lithographic process. The lithographic apparatus has a controller configured to define a control grid associated with positioning of a substrate within the lithographic apparatus. The control grid is based on a device layout, associated with a patterning device, defining a device pattern which is to be, and/or has been, applied to the substrate in a lithographic process.

Status:
Grant
Type:

Utility

Filling date:

22 Nov 2017

Issue date:

14 Dec 2021