ASML Holding N.V.
Substrate support, lithographic apparatus, substrate inspection apparatus, device manufacturing method
Last updated:
Abstract:
The invention provides a substrate support for supporting a substrate, comprising: a support body, which support body comprises a support surface for supporting the substrate, a rotary dither device, which is configured to induce a relative rotary dither motion between the substrate and the support surface of the support body around a rotation axis which is perpendicular to the support surface.
Status:
Grant
Type:
Utility
Filling date:
16 Jul 2019
Issue date:
26 Oct 2021