ASML Holding N.V.
System, a lithographic apparatus, and a method for reducing oxidation or removing oxide on a substrate support

Abstract:

A system including: a substrate support configured to hold a substrate; a conductive or semi-conductive element contacting the substrate support and covering at least part of the substrate support; and a charging device configured to apply a positive potential to the conductive or semi-conductive element with respect to the part of the substrate support that is covered by the conductive or semi-conductive element.