ASML Holding N.V.
Optimization of a lithography apparatus or patterning process based on selected aberration

Abstract:

A method including obtaining a selected component of optical aberration of or for a lithography apparatus, under a processing condition; computing an approximate of a cost function, based on the selected component; and producing an adjustment of the lithography apparatus or a patterning process that uses the lithography apparatus, based on the approximate of the cost function.