ASML Holding N.V.
Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured

Abstract:

A method of adjusting a metrology apparatus, the method including: spatially dividing an intensity distribution of a pupil plane of the metrology apparatus into a plurality of pixels; and reducing an effect of a structural asymmetry in a target on a measurement by the metrology apparatus on the target, by adjusting intensities of the plurality of pixels.