ASML Holding N.V.
Lithographic method and apparatus

Abstract:

A method of reducing an aberration arising during operation of a lithographic apparatus, the method comprising measuring the aberration to obtain an aberration signal, the aberration signal comprising a first component and a second component, wherein the first component of the aberration signal comprises a first frequency band and the second component of the aberration signal comprises a second frequency band, wherein the first frequency band comprises frequencies that are higher than frequencies comprised in the second frequency band, calculating a correction, wherein a first part of the correction is calculated based on the first component of the aberration signal, and applying the correction to the lithographic apparatus.