ASML Holding N.V.
Fluid handling structure, a lithographic apparatus and a device manufacturing method

Abstract:

A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO.sub.2 gas so as to provide a substantially pure CO.sub.2 gas environment adjacent to, and radially outward of, the space.