ASML Holding N.V.
Lithographic apparatus, lithographic projection apparatus and device manufacturing method

Last updated:

Abstract:

The present invention relates to a lithographic apparatus, comprising: --a primary frame (10) which is provided with a functional unit (11, 12, 14), --a secondary frame (20), --a primary frame support (30), which is adapted to support the primary frame onto the secondary frame, --a flexible utility connection (40), adapted to connect the functional unit to an auxiliary system (51, 52, 53), --a vibration isolation body (60) having a body mass, which is moveably connected to the secondary frame by a flexible passive body support (61) having a body support stiffness, wherein the flexible utility connection is fixed to the vibration isolation body at a distance from the primary frame.

Status:
Grant
Type:

Utility

Filling date:

30 Jan 2018

Issue date:

17 Nov 2020