ASML Holding N.V.
Methods and apparatus for use in a device manufacturing method

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Abstract:

Methods and associated apparatus for reconstructing a free-form geometry of a substrate, the method including: positioning the substrate on a substrate holder configured to retain the substrate under a retaining force that deforms the substrate from its free-form geometry; measuring a height map of the deformed substrate; and reconstructing the free-form geometry of the deformed substrate based on an expected deformation of the substrate by the retaining force and the measured height map.

Status:
Grant
Type:

Utility

Filling date:

8 Aug 2018

Issue date:

18 Jan 2022