ASML Holding N.V.
Methods of determining stress in a substrate, control system for controlling a lithographic process, lithographic apparatus and computer program product

Abstract:

A method and control system for determining stress in a substrate. The method includes determining a measured position difference between a measured position of at least one first feature and a measured position of at least one second feature which have been applied on a substrate, and determining local stress in the substrate from the measured position difference.