ASML Holding N.V.
Method to obtain a height map of a substrate having alignment marks, substrate alignment measuring apparatus and lithographic apparatus

Abstract:

The present invention provides a method to obtain a height map of a substrate having alignment marks, the method comprising the steps: determining a height of one or more locations or areas of the substrate, and determining the height map of the substrate on the basis of the determined height of the one or more locations or areas of the substrate and a shape model of the substrate.