ASML Holding N.V.
Lithographic apparatus and device manufacturing method involving a heater

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Abstract:

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Status:
Grant
Type:

Utility

Filling date:

13 Nov 2020

Issue date:

5 Jul 2022