CMC Materials, Inc.
UV-CURABLE RESINS USED FOR CHEMICAL MECHANICAL POLISHING PADS

Abstract:

The invention provides a UV-curable resin for forming a chemical-mechanical polishing pad comprising: (a) one or more acrylate blocked isocyanates; (b) one or more acrylate monomers; and (c) a photoinitiator. The invention also provides a method of forming a chemical-mechanical polishing pad using the UV-curable resin.