Entegris, Inc.
SILICON PRECURSOR COMPOUNDS AND METHOD FOR FORMING SILICON-CONTAINING FILMS
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Abstract:
Provided are certain silicon precursor compounds which are useful in the formation of silicon-containing films in the manufacture of semiconductor devices, and more specifically to compositions and methods for forming such silicon-containing films, such as films comprising silicon dioxide or silicon nitride.
Status:
Application
Type:
Utility
Filling date:
23 Jun 2021
Issue date:
23 Dec 2021