Entegris, Inc.
SILICON PRECURSOR COMPOUNDS AND METHOD FOR FORMING SILICON-CONTAINING FILMS

Last updated:

Abstract:

Provided are certain silicon precursor compounds which are useful in the formation of silicon-containing films in the manufacture of semiconductor devices, and more specifically to compositions and methods for forming such silicon-containing films, such as films comprising silicon dioxide or silicon nitride.

Status:
Application
Type:

Utility

Filling date:

23 Jun 2021

Issue date:

23 Dec 2021